Improving the Processing Efficiency of Femtosecond Laser Sulfur Hyperdoping of Silicon by Diffractive Beam Shaping

dc.contributor.author	Mc Kearney, Patrick
dc.contributor.author	Lebershausen, Ingo
dc.contributor.author	Paulus, Simon
dc.contributor.author	Kontermann, Stefan
dc.contributor.other	Fachbereich Ingenieurwesen
dc.date.accessioned	2025-11-25T12:09:02Z
dc.date.available	2025-11-25T12:09:02Z
dc.date.issued	2023
dc.identifier.issn	1880-0688
dc.identifier.uri	https://hlbrm.pur.hebis.de/xmlui/handle/123456789/406
dc.format.extent	S. 72-76
dc.language.iso	en
dc.relation.ispartof	Journal of Laser Micro/Nanoengineering
dc.rights.uri	https://rightsstatements.org/page/InC/1.0/
dc.subject	femtosecond-laser hyperdoping
dc.subject	black silicon
dc.subject	beam shaping
dc.subject	spatial light modulator
dc.subject	processing efficiency
dc.subject.ddc	600 Technik::620 Ingenieurwissenschaften
dc.subject.ddc	500 Naturwissenschaften::530 Physik
dc.title	Improving the Processing Efficiency of Femtosecond Laser Sulfur Hyperdoping of Silicon by Diffractive Beam Shaping
dc.type	Aufsatz
pur.source.volume	18
pur.source.issue	2
dc.description.version	Published Version
pur.source.date	2023
dc.identifier.doi	10.2961/jlmn.2023.02.2003
dc.identifier.url	http://www.jlps.gr.jp/jlmn/uploads/23-005z.pdf
pur.fundingProject	/ / 03INT701AA
pur.scientific	true
pur.typeDCMI	Text

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